A small desktop plasma cleaning machine for surface modification and cleaning of samples.

Purpose:
The functional groups attached to the surface of polymer materials improve adhesion and cohesion. By oxidation reaction, - OH is produced on the surface Functional groups such as C=O and - COOH (influenced by trace amounts of water and carbon dioxide).
In nitrogen plasma, nitrogen atoms are absorbed on the surface, generating functional groups such as - NH2.
• Crystal silicon circular etching.
Surface modification of materials (metals, polymers, films, ceramics, etc.).
Asbestos pretreatment (membrane filtration ashing).
From electronic devices to the biochemical market.
Low temperature ashing (for polymer materials, coal, food, etc.).
Use glass and PDMS board to paste PDMS chips.
• Surface organic matter removal.

characteristic:
High performance output type (PR200) with RF of 200W.
Due to its compact size, the desktop computer can be installed in very small positions.
Synchronization, automatic tuning, simple operation (PR200).
• Plasma reactor (ashing equipment) (PR200).
• Synchronization, automatic tuning (PR200).

Product advantages:
The plasma cleaning machine has good cleaning effect, high cleaning efficiency, high power, and wide application range.
There are no requirements for material, appearance size, etc. for cleaning samples.
During the plasma cleaning process, the temperature rise is very small and can basically reach room temperature treatment.
Efficient specially designed electrodes ensure the generation of uniform plasma.
Specially designed electrodes and tray structures ensure comprehensive and effective cleaning of samples.


Specifications: